| 摘要 |
PURPOSE:To reduce interlayer discrepancies by a method wherein the stage position of each shot is determined by using stored data and exposure of each shot is performed at that position. CONSTITUTION:An alignment process 8 is provided before a film forming process 4 and a resist coating process 5. That is, alignment mark positions are measured in the alignment process 8 and the data are stored and alignment and exposure is performed after the film forming process 4 and the resist coating process 5 by using the stored data. By measuring the alignment mark positions before the film forming process 4 and resist coating process 5, alignment can be performed without various harmful influences at all. With this constitution, the influences of the film coverings other than resist films can be eliminated and the discrepancies can be reduced. |
