发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To improve the water developing, the water resisting and the screen adhesive properties of the title composition by incorporating an inner cross- linking type acrylic resin emulsion in the component of the resin composition as a synthetic resin emulsion using especially PVA as an emulsifier. CONSTITUTION:The resin composition is mainly composed of three components comprising the aqueous emulsion of an inner crosslinking type acrylic resin which has >=65wt.% of a trichlene insoluble matter, and is obtd. by subjecting an acrylic monomer and a monomer having two or more of polymerizable unsatd. groups to an emulsion polymerization in the presence of polyvinyl alcohol (PVA) having a degree of polymerization of <=1,500, the polyvinyl alcohol and/or its derivative and a photosensitive agent. And, the monomer having two or more of the polymerizable unsatd. groups is composed of the monomer having two or more of allyl groups. Thus, the characteristics such as the water developing, the water resisting and the screen adhesive properties of the resin composition are sufficiently satisfied.
申请公布号 JPH0219848(A) 申请公布日期 1990.01.23
申请号 JP19880168680 申请日期 1988.07.08
申请人 HOECHST GOSEI KK 发明人 ONISHI KAZUMASA
分类号 G03F7/027;G03F7/033;G03F7/12 主分类号 G03F7/027
代理机构 代理人
主权项
地址