| 摘要 |
PURPOSE:To provide the target and cathode free of an abnormal discharge by engaging shield members with a step provided on the periphery of the sputtering target at regular intervals to avoid the deposition of the spattered particles on the opening of the shield member. CONSTITUTION:A step with the protruding central part is provided on the whole periphery of the upper surface of a sputtering target 1, and the shield members 2 for limiting the sputtering region are engaged with the step of the target 1 at intervals of about 2mm. At this time, the upper surface of the shield member 2 is made flush with or lower than the upper surface of the target 1. The target particles spattered from the upper surface of the target 1 are deposited by this sputtering device. Although the particles are spattered radially upward from the upper surface of the target, the spattered particles are not deposited on the member 2, because the upper surface of the member 2 is not higher than the upper surface of the target 1. |
