| 摘要 |
PURPOSE:To protect a stage from damage caused by reactive gas and improve the life and reliability of a projector by a method wherein an airtight gas container is provided on the stage and position control is performed in accordance with inclination detection signals. CONSTITUTION:When a pattern projector is exposing, a Z-stage driver 215 and an L-stage driver 216 output control signals corresponding to detection signals given by a system 210 detecting the focus position of a projection lens L1 and a system 212 detecting the direction of the inclination of a wafer W against a surface to which a light is applied from the projection lens L1 respectively. In accordance with the control signals, a Z-stage driving motor 209Z and L-stage driving motors 209La and 209Lb are driven. Then a Z-stage SZ is shifted to a Z-direction and the inclination of an L-stage SL is corrected and the wafer W position is so corrected as to have the exposed region of the wafer W surface leveled at the focus position of the projection lens L1. |
