发明名称 METHOD AND DEVICE OF CLEANING GAS
摘要 PURPOSE:To perform stable emission of photoelectron for a long time, to perform stable and high-efficient charge to fine particles for a long time, and to facilitate maintenance and management by a method wherein an ultraviolet ray and/or radiation source is situated in a position located separately from treated gas and a photoelectron emitting material is irradiated by using a reflection surface. CONSTITUTION:After air containing microorganisms sucked with the aid of the fan of a fan part 8 is filtered by a prefilter 20, the air is irradiated with ultraviolet rays by means of a photoelectron emitting material 21, an ultraviolet ray lamp 22 mounted outside a gas flow passage, an ultraviolet rays reflection surface 23, a ultraviolet ray pass material 24, and an ultraviolet ray irradiating part 9 formed with electrodes 25. The irradiation with ultraviolet rays causes collection of fine particles in air charged by photoelectron emitted from the photoelectron emitting material by a charge fine particle collection filter 10 to provide clean air 26. In a gas treating container B formed by an ultraviolet ray pass material, an air cleaning space A is separated away from an ultraviolet ray lamp 20. Irradiation with ultraviolet rays by means of an ultraviolet ray lamp mounted in the gas treating container B is effected effectively through utilization of a reflection surface.
申请公布号 JPH0210034(A) 申请公布日期 1990.01.12
申请号 JP19880158197 申请日期 1988.06.28
申请人 EBARA RES CO LTD;EBARA CORP 发明人 FUJII TOSHIAKI;SHINOZUKA SHUHEI
分类号 F24F3/16 主分类号 F24F3/16
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