| 摘要 |
PURPOSE:To remove a suspended chromium film from on a protection film entirely without forming any step at the absence part of a mask by forming the protection film which is not peeled off in a lift-off process between a substrate and resist by coating. CONSTITUTION:The protection film 7 and photoresist film 5 are adhered in order on a substrate 2 where a light shielding film pattern 1 is formed while covering the light shielding film pattern 1, the photoresist film 5 on a pinhole 5 is exposed in a spot, and development is carried out to form an opening on the pinhole 3. The photoresist is used as the mask to etch the protection film 7 on the pinhole 3 and a light shielding film 6 for correction is adhered over the entire surface of the substrate 2 while covering the opening; and the photoresist film 5 and light shielding film 6 for correction are lifted off and removed, then the protection film 7 is peeled off, and the light shielding film 6P for correction is adhered in the pinhole 3. Consequently, when the white defect of the mask is corrected, such a secondary defect that the residues of the light shielding film 6 used for the correction stick on the absent part of the light shielding film pattern 1 is prevented from occurring. |
