发明名称 PHOTOMASK
摘要 PURPOSE:To prevent a light shield film pattern from being broken owing to charged-up static electricity by constituting a conductive film area surrounding a light shield film area as one continuous area. CONSTITUTION:A chromium film 2 on a glass substrate 1 forms the continuous conductive area surrounding the light shield area so that eight corner areas among P11-P57 have corners cut. Thus, the large conductive area is formed to evade discharge even in the case of a charge-up state, so the pattern is not broken. When the chromium film is left in the continuous state, the chromium film 2 is formed on the transparent glass substrate 1 and a positive resist film 3 is formed thereupon; and the periphery is coated with a protective film 4 formed by blackening a polyvinyl-alcohol solution with dye and then exposed, so that the resist below the protective film 4 is not exposed and left as a mask. Consequently, the chromium film at the periphery can be left.
申请公布号 JPH02968(A) 申请公布日期 1990.01.05
申请号 JP19880140700 申请日期 1988.06.08
申请人 FUJITSU LTD 发明人 ARAIHARA SATOSHI
分类号 G03F1/00;G03F1/40;H01L21/027;H01L21/30 主分类号 G03F1/00
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