发明名称 CONDUCTIVE METAL-FILLED COMPOSITES VIA DEVELOPING AGENTS
摘要 <p>A conductive metal-filled substrate is formed by intermingling copper or nickel particles into the substrate, contacting the metal particles with a specified developing agent, and heating the metal particles and the developing agent. The filled substrates are electrically conductive and are useful for a variety of uses such as EMI shielding.</p>
申请公布号 WO1989012306(A1) 申请公布日期 1989.12.14
申请号 US1989002498 申请日期 1989.06.07
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