| 摘要 |
<p>Polyorganosiloxane which are useful as resist materials for use in microprocesses such as large scale integration device fabrication are those of the formula <CHEM> where R<1> is a monovalent hydrocarbon group having 1 to 6 carbon atoms; R<2> is a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms; x and z are positive numbers; y is zero or a positive number; and x, y, and z have values such that their ratios are 0.3 </= (x + y)/z </= 4; and zero </= y/x </= 100.</p> |
