| 摘要 |
PURPOSE:To prevent a lithography substrate from being distored and to make it possible to form a fine pattern with high accuracy by a method wherein an inner cassette for specifying the substrate flatness to fix the substrate and an outer cassette fixing and holding the inner cassette, in which the inner cassette is charged, are both constituted into a double structure. CONSTITUTION:A substrate flatness specifying inner cassette 8 to fix a lithography substrate 3 as the flatness of the substrate 3 is held and an outer cassette 10 for an inner cassette fixing substrate, in which this inner cassette 8 is charged, are both constituted into a double structure. Accordingly, the lithography surface of the substrate 3 is prevented from being distored. Thereby, a highaccuracy electron beam or ion beam lithography becomes possible regardless of the thickness and the material of the lithography substrate. |
