| 摘要 |
PURPOSE:To obtain an easily photopolymerizable photosensitive material suitable for manufacture of a photoresist superior in sensitivity, resolution, etc., by using a photosensitive material consisting of a specified cyclic sulfonium zwitterion. CONSTITUTION:A photosensitive material to be used is an aryl cyclic sulfonium zwitterion having general formulaIin which phi is benzene, naphthalene, or anthracene; R is Cl, Br, 1-4C alkyl; a is 0, 1, or 2; A is formula II or III; R<1> is 1-4C alkyl or phenyl; b is 0, 1, or 2; (-)n is bond; and n is 0, 1, or 2. For example, said zwitterion is dissolved in a solvent, such as methanol, and coated on a support to form a film serviceable for a photoresist used for manufacture of an electronic article. The compound of formulaIis embodied by formulae IV, V, etc., and the compound of formula IV is prepared by reaction of o-cresol with tetrahydrothiophene-1-oxide. |
