| 摘要 |
PURPOSE:To obtain the photosensitive composition with a high sensitivity, the pattern forming method using the same and the polymer compd. capable of inducing to radioactive rays with the high sensitivity by composing the photosensitive composition of a specified copolymer and a water-soluble polymer compd. which is capable of allowing it to react with the copolymer and has a reciprocity law failure characteristic. CONSTITUTION:The photosensitive composition is composed of the copolymer contg. at least a water soluble nonphotosensitive monomer unit and a monomer unit having an azide group and an electrolytic functional group, and the water- soluble polymer compd. which is capable of allowing it to react with the copolymer and has the reciprocity law failure characteristic. The compounding amount of a 1st. monomer unit, namely a water-soluble nonphotosensitive monomer unit is preferably 10-40% in the copolymer. The compounding amount of a 2nd. monomer unit is preferably 90-10% in the copolymer. Thus, the photosensitive composition has the high sensitivity and is usable for the production of, for example, a large scale black matrix cathode ray tube, and can be exposed with a short time. |
