| 摘要 |
<p num="1"><br/><br/><br/><br/> PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS<br/> AND METHODS FOR MAKING AND USING<br/><br/> ABSTRACT OF THE DISCLOSURE<br/><br/> A photosensitive polyamide acid composition consisting<br/>essentially of chemically combined units of the formula<br/><br/><img he="0" wi="0" file="" alt="" img-content="undefined" img-format="jpg" inline="yes" orientation="portrait" /><br/><br/>where R is a tetravalent organic radical or a tetravalent<br/>organosiloxane-containing radical, R1 is a divalent organic<br/>radical or a divalent organosiloxane-containing radical, and A<br/>is a photoreactive acrylate, cinnamate or 2,3-diphenylcyclopro-<br/>penol ester containing radical.<br/> |
