发明名称 VACUUM PROCESSOR
摘要 PURPOSE:To obtain a vacuum processor which can enhance thermal conductivity between a sample and an electrostatic chuck electrode for electrostatically attracting the sample and accurately control the temperature of the sample through a sample base by supplying gas through gas dispersing groove between both and diffusing it in a thin film state between both. CONSTITUTION:A vacuum vessel 1 is controlled therein to a predetermined pressure on the basis of the indication of a pressure gauge 14, and medium of predetermined temperature is supplied to the medium passage 3a of a sample base 3 to control the temperature of the base 3. Small amount of inert gas such as nitrogen gas is supplied by a gas pipe 15 to a gas dispersing groove 20 formed on the upper face of a first insulating layer 4b under the control of a gas flowrate control valve 17. This gas is diffused in a small gap between the first insulating layer 3b of an electrostatic chuck electrode 4 and a sample A in a thin film state. Since thermal conductivity between the sample A and the electrode 4 is remarkably enhanced by the presence of the gas of the thin film state, the temperature of the sample A preferably follows up the temperature of the base 3.
申请公布号 JPH01298721(A) 申请公布日期 1989.12.01
申请号 JP19880129772 申请日期 1988.05.27
申请人 TOKUDA SEISAKUSHO LTD 发明人 TEZUKA MASASHI;NAGOSHI TADANOBU;TOKURA TSUNEMASA
分类号 H01L21/302;H01L21/3065;H01L21/68;H01L21/683 主分类号 H01L21/302
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