发明名称 EXPANDED X RAYS ABSORPTION FINE STRUCTURE MEASURING APPARATUS
摘要 PURPOSE:To enable temperature dependent measurement from a low to high temperature, by detecting and feeding back a difference between a sample temperature and a set temperature measured with a temperature measuring element to a Peltier element to control current flowing therethrough. CONSTITUTION:After X rays radiated from an X-ray source 1 pass through a first slit 2, energy of incident X rays is controlled variably with a monochrometer 3 with respect to a sample 4 to be measured. Then, after passing through a second slit 5, the incident X rays with incident energy measured 6 are incident on a sample 4 held with a rotatable sample holder 7. Then, an absorption of the X rays transmitted through or reflected on the sample 4 are detected based on intensity of the X rays with an X rays detector 8. Then, a temperature measuring elements 11 is provided at a part of the holder 7 to detect the temperature of the sample 4 together with a Peltier element 10. A sample temperature data measured is taken into a temperature control means 12 to feed back a difference from a sample temperature set to the element 10 thereby permitting a variable control of the temperature of the sample 4.
申请公布号 JPH01296149(A) 申请公布日期 1989.11.29
申请号 JP19880127262 申请日期 1988.05.25
申请人 RICOH CO LTD 发明人 KATSURAGAWA TADAO;TANI KATSUHIKO;CHIBA ERIKO
分类号 G01N23/06 主分类号 G01N23/06
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