| 摘要 |
PURPOSE:To obtain a resist pattern having no skirt at all after its development by covering a board having metal at its uppermost layer with specific photosensitive resin composition, further covering the covering layer with specific photosensitive resin composition, exposing and developing it. CONSTITUTION:A board having metal at its uppermost layer is covered with photosensitive resin composition I capable of forming an image with 300-900mJ/cm<2> of radiation energy of an ultraviolet ray, the covering layer is covered with photosensitive resin composition II capable of forming an image with 10-290mJ/cm<2> of radiation energy of the ultraviolet ray, exposed and developed. The compositions I, II contain as main ingredients vinyl copolymer, ethylenic unsaturated compound and optical initiator, radical polymerization occurs in a photosensitive layer by the radiation of the ultraviolet ray, and of negative type in which its resistance to a developer is increased. A skirt is not formed in the shape of a resist obtained by this. |
