| 发明名称 |
A METHOD AND APPARATUS FOR ION BEAM GENERATION |
| 摘要 |
A method and apparatus for ion beam generation are disclosed wherein opposed targets (T1, T2) are sputtered by plasma produced in a space confined by these targets (T1, T2) and ionized particles (10) thereby produced are emitted from the space in a given direction in an electric field (E). |
| 申请公布号 |
DE3480039(D1) |
申请公布日期 |
1989.11.09 |
| 申请号 |
DE19843480039 |
申请日期 |
1984.07.20 |
| 申请人 |
KONISHIROKU PHOTO INDUSTRY CO. LTD. |
发明人 |
NAOE, MASAHIKO;ISHIBASHI, SHOUZO |
| 分类号 |
C23C14/00;C23C14/06;C23C14/22;C23C14/35;G11B5/851;H01J27/14;H01J37/08;(IPC1-7):H01J27/02;C23C14/48;G11B5/84 |
主分类号 |
C23C14/00 |
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