| 摘要 |
<p>PURPOSE:To enable the X-ray exposure with high positional and long pitch precision to be performed by a method wherein a collective exposure region is divided into multiple exposure regions to reduce the dimension of individual window region so that the collective exposure region may be provided with exceeding two each of exposure regions in the same shape with the gap between mutually in parallel and adjacent exposure regions equal to the length of the exposure region in one direction. CONSTITUTION:An X-ray mask 1 is provided with two each of the same rectangular exposure regions 2 in the lateral width of a and the longitudinal width of 2b called A1 and A2 while these regions 2 are separated at the gap of a with a pair of opposite sides in the lateral direction positioned on the same straight lines. Furthermore, the X-ray mask 1 seen from a section along a straight line PQ has X-ray absorbing body pattern 4 on one side of an X-ray transmitting film 3 as well as holding frames 5 with exposure window regions 6 on the other side. Thus, the exposure window regions 6 including individual exposure region are divided into smaller sections to augment the positional and long pitch precision of an X-ray mask pattern. Through these procedures, the X-ray mask with augmented positional and long pitch precision can be manufactured.</p> |
