CLEANING PROCESS AND DEVICE FOR SEMICONDUCTOR SUBSTRATE,申请号JP19880108141-传众专利搜索

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发明名称	CLEANING PROCESS AND DEVICE FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH01278028(A)	申请公布日期	1989.11.08
申请号	JP19880108141	申请日期	1988.04.28
申请人	MITSUBISHI ELECTRIC CORP	发明人	TOKUI AKIRA;TSUKAMOTO KATSUHIRO
分类号	B08B7/00;H01L21/304	主分类号	B08B7/00
代理机构		代理人
主权项
地址

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