发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To optimize development by incorporating a compd. contg. >=1 thiol and/or thioether groups in the molecule and >=1 acid groups of <=14 pKa value into the negative type photosensitive compsn. contg. a diazonium compd. and a high-polymer compd. which is soluble in an aq. alkaline soln. CONSTITUTION:The compd. having >=1 thiol and/or thioether groups in the molecule and >=1 acid groups of <=14 pKa value is incorporated into the negative type photosensitive compsn. contg. the diazonium compd. and the high- polymer compd. soluble in the aq. alkaline soln. The compd. having the >=1 thiol and/or thioether groups and >=1 acid group of <=14 pKa value refers to the compd. having the HS- and/or -S- group (including -S-S-) in the molecule and the acid groups of <=14 pKa value. For example, said compd. is -COOH, -SO3H, -CONHCO-, and phenolic hydroxyl group and the HS- and/or -S- group and further another >=1 HS- groups are incorporated in the molecule.
申请公布号 JPH01270047(A) 申请公布日期 1989.10.27
申请号 JP19880099551 申请日期 1988.04.22
申请人 FUJI PHOTO FILM CO LTD 发明人 AOSHIMA KEITARO;AKIYAMA YOSHIJI
分类号 G03F7/016 主分类号 G03F7/016
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