发明名称 Insulated gate bipolar transistor.
摘要 <p>An insulated gate bipolar transistor (IGBT) permits a large current to uniformly flow. A plurality of single crystal island regions (61) are formed in a supporting substrate (2) using dielectric films (1). Formed in each of the island regions are an n&lt;-&gt; first region (61), a p second region (41) within the first region, an n&lt;+&gt; third region (32) within the second region (41) and a p&lt;+&gt;&lt;+&gt; fourth region (11) between the first region (61) and the dielectric film. All of these regions are exposed to the surface of the island region. Formed on the surface of the island region are a first main electrode (E) kept in ohmic contact with the second (41) and third (32) regions, a second main electrode (C) kept in ohmic contact with the fourth region (11) and a control electrode (G) located on the second (41) and third region (32) through an insulator (6).</p>
申请公布号 EP0338312(A2) 申请公布日期 1989.10.25
申请号 EP19890105833 申请日期 1989.04.03
申请人 HITACHI, LTD. 发明人 SAKURAI, NAOKI;MORI, MUTSUHIRO;TANAKA, TOMOYUKI;YASUDA, YASUMICHI;NAKANO, YASUNORI;YATSUO, TSUTOMU
分类号 H01L29/68;H01L21/76;H01L29/08;H01L29/739;H01L29/78 主分类号 H01L29/68
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