| 摘要 |
PURPOSE:To heighten the resolution of an aligner by controlling a local exposure time in an exposure area by a method wherein a speed controllable moving aperture is provided as an exposure shutter. CONSTITUTION:A mask 102 is placed so as to face a water 10 in parallel. With the wafer 101 moved by a wafer moving stage 103, areas of the wafer 101 is exposed one after another until the whole surface is exposed. A sensor 104 mounted on the wafer moving stage 103 measures a strength of illuminated light which is inputted onto the wafer, at a desired point within the exposure area. A moving aperture constitutes an exposure shutter together with a spare shutter 106. A synchrotron emitted light 108 is expanded in the direction having a strength distribution via convex cylindrical mirror 109 to irradiate a required exposure area of the mask and the wafer of an aligner. |
