| 摘要 |
PURPOSE:To improve the sensitivity of the title composition against radiation rays such as an UV ray, far UV ray, X ray and electron beam by incorporating a polymer compd., a compd. capable of producing amine when exposed to the radiation ray, and a carboxylic acid or its derivative capable of losing carboxylic acid group by a decarboxylation reaction. CONSTITUTION:The radiation sensitive composition contg. the compd. capable of producing the amine when exposed to the radiation ray, and the carboxylic acid capable of losing carboxylic group by the decarboxylation reaction is applied on a substrate to form a thin film, followed by imagewisely exposing the thin film to the radiation ray. In the coated part of the substrate which has been exposed to the radiation ray, the carboxylic acid causes the decarboxylation reaction by a catalytic action of the amine produced with the exposure of the radiation ray, thereby losing the function of carboxylic acid. Accordingly, the solubility characteristic of the composition at an exposed region and an unexposed region is remarkably different with each other. Therefore, the positive or the negative pattern of the composition can be obtd. by selecting a developer. Thus, the sensitivity of the composition to the active radiation rays such as far UV rays, electron beam and X ray, etc., is improved. |
