发明名称 Process of forming a superconductive wiring strip in low temperature ambient.
摘要 <p>According to the present invention, a superconductive oxide is deposited on a substrate (9) with an assistance of a ultra-violet light radiation (U.V.), and an oxygen gas (6) is directly supplied to the major surface of the substrate, so that active oxygen atoms are produced around the substrate and promote the crystal growth of the superconductive oxide even if the deposition is carried out in a relatively low temperature ambient not greater than about 650 degrees in centigrade.</p>
申请公布号 EP0334374(A2) 申请公布日期 1989.09.27
申请号 EP19890105286 申请日期 1989.03.23
申请人 MITSUBISHI METAL CORPORATION 发明人 TAKESHITA, TAKUO MITSUBISHI METAL CORPORATION;SUGIHARA, TADASHI MITSUBISHI METAL CORPORATION;KONDO, HIDEYUKI MITSUBISHI METAL CORPORATION;FUJINO, SHUICHI MITSUBISHI METAL CORPORATION
分类号 C01G29/00;C23C16/48;C30B25/02;C30B29/22;H01B13/00;H01L39/24;C01G3/00;C01B13/14;C01G1/00 主分类号 C01G29/00
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