| 摘要 |
PURPOSE:To obtain a desired lens face shape by using light of the wavelength band which is hardly energy-absorbed in gaseous materials and executing laser CVD while stepwise or continuously changing the mixing ratios of SiH4, NO and NH3 in the gaseous raw materials. CONSTITUTION:The gaseous mixture composed of the SiH4, NO and NH3 is used as the gaseous materials and the light of the wavelength and which is hardly energy-absorbed in the gaseous materials among the radiation light rays of a CO2 laser is used as an energy source. The laser CVD is executed while the mixing ratios of the SiH4, NO and NH3 in the gaseous materials are stepwise or continuously changed to form the material film which has a gauss distribution-like profile and has desired etching rates in the respective parts of the film by the stepwise or continuous change of the film compsn. This material film is etched. The microlens having the desired surface shape is thereby obtd. |
