ION IMPLANTATION APPARATUS AND METHOD FOR MASKLESS PROCESSING

摘要

Accelerated ions are formed into a beam. The ion beam is scanned over the surface of an object to be treated by use of a deflection appts.. The clock frequency of the deflection appts. is continuously controlled and the amt. of ion implantation is regulated. Thus the ions are selectively implanted onto the surface of the object and a desired ion implantation pattern is formed. This processing is an ion implantion method in which high precision is achieved easily.