发明名称 ELECTRONIC PART PROTECTIVE MATERIAL AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME
摘要 PURPOSE:To improve the film intensity, acid resistance and release properties at room temperature by using specified monoalkyl substituted phenol- formaldehyde novolak resin. CONSTITUTION:The title electronic part protective material is composed of monoalkyl substituted phenol-formaldehyde novolak resin. In this case, the alkyl radical is normally composed of 6-12 carbon elements preferably 6-8. The position of alkyl radical in the monoalkyl substituted phenol of alkyl radical is either metha or para to hydroxyl radical preferably para e.g., p- hexylphenol, p-octylphenol, p-nonylphenol, p-decylphenol, p-undecylphenol, p- laurylphenol, etc., can be enumerated. By using said materials, the film intensity, acid resistance of said materials can be improved enabling them to be released easily at room temperature.
申请公布号 JPH01236632(A) 申请公布日期 1989.09.21
申请号 JP19880280343 申请日期 1988.11.08
申请人 NIPPON ZEON CO LTD;FUJITSU LTD 发明人 SATO MASAKI;KAMIYA SHIGEMITSU;FUJIE NOBUO;TABUCHI SHUJI
分类号 H01L21/304 主分类号 H01L21/304
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