发明名称 METHOD AND APPARATUS FOR CLEANING GASES
摘要 <p>A method and an apparatus are used for removing solid, liquid and/or gaseous pollutants from a gas or gas mixture. By means of a gas distributing system (14), the gas is passed below the surface (34) of a bath (32) of washing or cleaning liquid in such a manner that it is caused to rise through the bath (32) in several partial flows, each partial flow having a volume flux independent of the size of the total gas flow. The polluted gas is caused to bubble through the liquid bath at a velocity which is higher than the velocity at which a free bubble rises through the bath. Each partial flow of the polluted gas is completely or almost completely screened off by partitions (48) from adjacent parts of the bath (32). This screening is preferably performed during a substantial part of the passage of the partial flows through the bath (32).</p>
申请公布号 WO1989008491(A1) 申请公布日期 1989.09.21
申请号 SE1989000112 申请日期 1989.03.08
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