| 摘要 |
PURPOSE:To prevent the generation of defects due to a residual developer in the following step by washing the developer adhered to the surface and back faces of a master disk with a water after developing it to remove the developer, followed by drying the plate. CONSTITUTION:The master disk 1 having an exposed photoresist film on the surface of the disk is mounted and fixed on a turn table 2, and a water is jetted on the master disk from a washing nozzle 3 and a back face washing nozzle 5 provided facing to the surface and back faces of the master disk respectively, while rotating the master disk 1, thereby removing the developer existing round about the surface and back faces of the master disk. Next, a dry air or a nitrogen gas coming from a dry nozzle 4 is sprayed towards from the center of the master disk 1 to the outer circumference thereof to dry the master disk, and at the same time, similarly, the back face of the disk 1 is dried by the back face dry nozzle 6. Thus, as the residue of the developer is not carried over to a following step, the generation of the defects in the following step is reduced. |
