| 摘要 |
<p>PURPOSE:To reduce the cost of an etching device to obtain a low-cost active matrix element for liquid crystal display by preventing the same pattern from being given to three layers of a diode consisting of an a-Si film and a Cr double- faced electrode and extending the Cr film pattern of the substrate-side electrode and using this pattern for connection to another diode or a scanning line. CONSTITUTION:With respect to the active matrix element where a-Si diodes of anti-parallel connection are connected in series to a liquid crystal driving electrode between the scanning line and a data line, a-Si diodes 11 and 12 consist of a Cr film 30, an a-Si film 40, and a Cr film 50 laminated on a transparent insulating substrate 10. The Cr film 50 more distant from the substrate 10 and the Cr film 30 under the a-Si film 40 are extended and are brought into contact with wirings 81 and 82 for connection to another diode and a scanning line 83. Thus, the active matrix element for liquid crystal display is obtained which has a small number of formed film layers and does not require reactive ion etching using gaseous Cl.</p> |
