发明名称 SPUTTERING TARGET AND PRODUCTION OF SUPERCONDUCTOR THIN FILM
摘要 PURPOSE:To obtain a thin film of superconductor of high reliability and high accuracy, by using a target mainly consisting of oxides of copper, alkaline earth metal and excessive bismuth and forming an oxide thin film on the base by the sputtering method. CONSTITUTION:A target is provided so that its main components are oxides containing at least bismuth, copper, alkaline earth metal (Ca, Sr) where the ratio of Bi is larger than the composition of the thin film. Then, the target is used to form an oxide thin film containing at least bismuth, copper, alkaline earth metal 22 on the base 21 (such as MgO base) by the sputtering method whereby the subject thin film of superconductor is obtained. It is preferred that the target is formed from a sintered product of a powder or particles and the alkaline earth is composed of 1:1 Ca and Sr and the molar proportion of bismuth is in the range of the equation.
申请公布号 JPH01208328(A) 申请公布日期 1989.08.22
申请号 JP19880032239 申请日期 1988.02.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ADACHI HIDEAKI;SETSUNE KENTARO;HIROCHI KUMIKO;ICHIKAWA HIROSHI;HATTA SHINICHIRO;WASA KIYOTAKA
分类号 H01L39/12;C01G1/00;C01G25/00;C01G29/00;C04B35/00;C04B35/45;C23C14/34;H01B12/06;H01B13/00;H01L39/24 主分类号 H01L39/12
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