| 摘要 |
<p>PURPOSE:To arrange respective color filter patterns on a substrate while maintaining high size accuracy and alignment accuracy by lifting off a 3rd color filter on etching prevention films while leaving 1st and 2nd color filters protected by the etching prevention films. CONSTITUTION:The 1st etching prevention film 5 is formed on the surface of the 1st color filter 2 on the substrate, the 2nd etching prevention film 8 is formed on the surface of the 2nd color filter 6, and etching is carried out. The 3rd color filter 9 is formed thereupon and the etching prevention films 5 and 8 are dissolved to lift off the 3rd color filter 9. Consequently, the 1st color filter 2 and 3rd color filter 9 and a 4th color filter consisting of the overlap part of the 1st color filter 2 and 2nd color filter 6 are arranged on the substrate 1 while the high size accuracy and alignment accuracy are maintained.</p> |
