| 摘要 |
PURPOSE:To improve the scratching resistance, heat resistance and durability of an antireflection film to be provided on a transparent plastic base material by forming said antireflection film under ion beam assist. CONSTITUTION:MgF2, SiO2, etc., are formed into single or multiple layers as the antireflection film by vacuum deposition, etc., on the transparent plastic base material consisting of polymethyl methacrylate, etc. The antireflection film is formed under the ion beam assist preferably at every film formation at the time of forming said film. The film is formed by using the ion beam of 300-1,000V voltage and 300-700mA current, using gaseous argon, oxygen, nitrogen, etc., as an ion material and projecting the ion beam by an ion gun. The density of the antireflection film material is, therefore, increased by the energy of the ion beam and the durability is improved without generating exfoliation even after long-term use. |
