发明名称 Method of manufacturing a semiconductor laser with autodoping control
摘要 A method of manufacturing a semiconductor light emitting device by forming a compound semiconductor structure with homo- or heterojunction therein having a first p-type compound semiconductor crystal layer at the top of the structure, growing a second p-type compound semiconductor crystal layer on the structure in a reactor, wherein, before the beginning of the crystal growth step, a p-type dopant is caused to flow into the reactor in which the structure is placed. In some embodiments, the flow of the p-type dopant continues after the completion of the crystal growth.
申请公布号 US4855250(A) 申请公布日期 1989.08.08
申请号 US19870138660 申请日期 1987.12.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMAMOTO, MOTOYUKI;TSUBURAI, YASUHIKO
分类号 H01L21/20;H01L21/205;H01L33/14;H01L33/30;H01L33/40;H01S5/00;H01S5/042;H01S5/223 主分类号 H01L21/20
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