| 摘要 |
In an electron beam apparatus in which an electron beam is irradiated on a specimen, secondary electrons are generated from the specimen under the bombardment of the electron beam, and voltage is applied to and a signal voltage is picked up from the specimen through a probe, a metal electrode is disposed on at least part of the outer peripheral surface of the probe through an insulator and the metal electrode is maintained at predetermined electrical potential. The secondary electrons can be shielded from a horizontal electric field generated from the probe and can be detected accurately by means of a detector.
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