| 摘要 |
PURPOSE:To easily form a large-sized uniform metallizing pattern when a metallized glass substrate having a pattern of an electrically conductive layer used to drive a display device is produced by selectively forming an ITO layer on a glass substrate and laminating a Cu layer and an Ni-P layer on the ITO layer by electroless plating. CONSTITUTION:A patterned indium tin oxide(ITO) layer 3 is formed on a glass substrate 1 for a display device such as a liq. crystal display device. The layer 3 is used as an electrode at the display part A and a display element such as a liq. crystal is formed. Metallizing layers 4, 5, 6 are formed on the layer 3 at the driving part B. Lead wires 7, 8 on an IC chip 10 on the central layer 5 are bonded to the left and right layers 4, 6. The metallizing layers at the driving part B are formed by patternwise laminating a Cu layer 9, an Ni-P layer 10 and an Au layer 11 by electroless plating on the ITO layer 3 formed on the substrate 1 with an SiO2 layer 2 inbetween so as to form a bonded metal layer. By adopting electroless plating, the large-sized uniform metallizing pattern can easily be formed.
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