发明名称 Method and apparatus for manufacturing compound semiconductor single crystal
摘要 A method of manufacturing a compound semiconductor single crystal, e.g. gallium arsenide wherein a container (11) containing a raw melt is placed in an atmosphere containing at least one monitor gas selected from hydrogen, oxygen, carbon monoxide, and carbon dioxide, a concentration of the monitor gas in the atmosphere is detected, and the detected concentration of the monitor gas is controlled to be a preset value. A compound semiconductor single crystal having a uniform carrier concentration can be obtained by controlling the concentration of the monitor gas.
申请公布号 GB2212796(A) 申请公布日期 1989.08.02
申请号 GB19880027909 申请日期 1988.11.30
申请人 * TOSHIBA KABUSHIKI KAISHA 发明人 JOHJI * NISHIO;TAKASHI * FUJII
分类号 C30B11/00;C30B15/00;C30B15/20;C30B27/02;C30B29/40;C30B29/42 主分类号 C30B11/00
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