发明名称 FOREIGN MATTER INSPECTING DEVICE
摘要 PURPOSE:To decide whether or not foreign matter is generated in a semiconductor manufacturing process by providing an exciting light irradiating means for the foreign matter and switching and using it and a light beam for normal foreign matter inspection. CONSTITUTION:A detection system for a foreign matter position, shape, etc., and a top lighting type fluorescent microscope system are switched by a switching mechanism 19, which consists of a linear moving base moves the exciting light generation light source 11, an exciting film 13, and a dichroic mirror 15 forth and back horizontally in one body while mounting them; and exciting light obtained from the light source 11 is excluded from the path R of reflected light in the backward movement state and put in the path R shown in a figure in the forward movement state. Consequently, fluorescent light generated by the foreign matter is photodetected or observed at almost, for example, 550nm to decide whether or not the foreign matter is generated in the semiconductor manufacturing process.
申请公布号 JPH01191044(A) 申请公布日期 1989.08.01
申请号 JP19880015477 申请日期 1988.01.26
申请人 HITACHI ELECTRON ENG CO LTD;SONY CORP 发明人 YANAI TOSHIAKI;HATTORI TAKESHI;KOYATA SAKUO
分类号 G01N21/88;G01N21/94;G01N21/956;H01L21/66 主分类号 G01N21/88
代理机构 代理人
主权项
地址