| 摘要 |
<p>PURPOSE:To contrive improvement both in moisture-resisting property and acidproof property by a method wherein a region in which the relative pattern interval of a film resistor will be widened and another region in which said pattern interval will be narrowed are alternately arranged on a sheetlike insulated substrate, a trimming work is conducted in phase direction toward the film resistors located on both sides with the widened region as a starting point. CONSTITUTION:A region in which the mutual pattern interval of a film resistor is relatively widened and another region in which said pattern interval is relatively narrowed are arranged alternately on a sheetlike insulated substrate 1. Trimming grooves 32 are formed by conducting a trimming work in phase direction toward the film resistor 31 located on both sides with the inside of the relatively widened region as a starting point. Also, the slit 33 to be used to divide the substrate is provided so that the region where the pattern interval will be relatively widened becomes a substrate dividing part, and also the element of the film resistor 4 will be formed in one set on the sheetlike insulated substrate 1 on which the film resistor 31 is formed. As a result, the unsatisfactory state in the increase of resistance value due to excessive adjustment of the film resistor can be eliminated, and the reliability in moisture- resisting property and acidityproof property can be improved.</p> |
