发明名称 |
APPARATUS FOR MANUFACTURING SURFACE STRUCTURES IN THE NANOMETER RANGE |
摘要 |
<p>The apparatus for manufacturing surface structures in the nanometer range comprises an aperture (11) having a diameter of less than 30 nanometers and maintaned above the surface (8) of a target (7) at a constant distance of about 1 nanometer, the aperture (11) being associated with a laser light source (13). The aperture/target assembly is housed in a processing chamber (1) within which an appropriate partial pressure of a reactant gas can be maintained with the aid of tubing (16, 17) and gauge means (21). The reactant gas may, for example contain metal alkyls and/or metal carbonyls which are dissociable by the laser beam with the metal phase being deposited on the surface (8) of the target (7) in the form of fine structures of nanometer dimensions. The aperture (11) and the target (7) are supported on a common base (2) which is vibration-insulated from the outside world by means of a damping device (3). The mutual rough and fine scanning displacements between the aperture (11) and the target are performed by xyz-drive modules (6, 15).</p> |
申请公布号 |
EP0196346(B1) |
申请公布日期 |
1989.07.19 |
申请号 |
EP19850103926 |
申请日期 |
1985.04.02 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GIMZEWSKI, JAMES KAZIMIERZ, DR.;POHL, WOLFGANG DIETER, DR.;DUERIG, URS THEODOR, DR. |
分类号 |
B23K26/12;B23K26/00;B23K26/02;C23C16/48;H01L21/268 |
主分类号 |
B23K26/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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