| 摘要 |
<p>PURPOSE:To reduce the cost of a photomask by using patterns which are common, but inverted for the patterning of an electrode film and the patterning of an insulating film. CONSTITUTION:The electrode film 2 and semiconductor film 6 are adhered to the entire surface in order and then patterned in the opposite order by photoetching. When the electrode film 2 is patterned, the pattern of the semiconductor film 6 which is photoetched before it serves as a mask, so this is utilized to use the pattern for photoetching the electrode film 2 as a pattern which is common to the pattern for photoetching the insulating film 7 thereafter, but mutually opposite or inverted in positive-negative relation. Therefore, the photomask can be used in common for the patterning of the electrode film 2 and insulating film 7. Consequently, the rate of the photomask in the manufacture cost is reduced to rationalize the manufacture of the display panel.</p> |
