发明名称 |
Ion source device |
摘要 |
An ion source device comprises a plasma generating vessel for generating plasma therein, a plurality of magnets arranged on an outer periphery of the plasma generating vessel to establish a cusp field in the plasma generating vessel, means for supplying a power to generate the plasma in the plasma generating vessel, and an anode electrode arranged on an inner wall of the plasma generating vessel and adapted to be heated by electrons emitted from the plasma and maintain the heat.
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申请公布号 |
US4847476(A) |
申请公布日期 |
1989.07.11 |
申请号 |
US19860942635 |
申请日期 |
1986.12.17 |
申请人 |
HITACHI, LTD. |
发明人 |
SATO, TADASHI;OHNO, YASUNORI;KUROSAWA, TOMOE;SEKIMOTO, NOBUYA;HAKAMATA, YOSHIMI;KUROSAWA, YUKIO;HIRASAWA, KUNIO |
分类号 |
H01L21/265;H01J27/08;H01J27/14 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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