| 摘要 |
PURPOSE:To allow a photomask to be scarcely flawed, to improve its cleaning property, as well, and to form a liquid crystal display element for scarcely causing a defect by using the photomask in which a pattern part of the photomask has been coated with a transparent and hard inorganic insulating film of SiO2, TiO2, MgF2, etc. CONSTITUTION:On a glass substrate 1, a shielding film 2 of Cr, etc., is formed by patterning it. Also, on said film, a transparent and hard inorganic insulating film 3 of SiO2, TiO2, MgF2, etc., is formed. The forming method is executed by a dipping method, spattering and vapor-deposition. In this state, when thickness of SiO2 has been changed, when the thickness is set to 1,500-2,000Angstrom , the countermeasure for a flaw, the facilitation of cleaning and the transmittivity are improved. When the thickness is too thick, the transmittivity drops. In such a way, a photomask is scarcely flawed, and its cleaning property is also improved, therefore, a pin hole on an electrode of a liquid crystal display element is also eliminated. Also, the photomask can be used semipermanently. |
