| 摘要 |
PURPOSE:To form a pattern with high resolution without having halation and notching on a high-reflectivity substrate by incorporating a specific compd. into the title compsn. CONSTITUTION:The compd. expressed by the formula I is incorporated into the compsn. In the formula I, X, Y are respectively the same or different groups and denote electron-withdrawing groups; R1 denotes an alkylene group of 1-10 C which may be further substd.; R2 denotes a hydrogen atom., substd. or unsubstd. alkyl group of 1-10 C, alkenyl group or aralkyl group; R3, R4 are respectively the same or different groups and denote a hydrogen atom., substd. or unsubstd. lower alkyl group, lower alkoxy group, amide group or halogen atom. The pattern of the high resolution having no halation and notching is thereby stably formed even with the high-reflectivity substrate. |
