发明名称 Field effect transistor.
摘要 <p>A semiconductor field effect transistor is provided which permits controlling of the phase of carriers between a source region and a drain region formed in a first semiconductor layer. Such control can be used to modulate characteristics such as the electric conductivity and drain current of the transistor. To accomplish this control, a gate electrode (1) is formed over a portion of the first semiconductor layer (7) between the source and drain regions (8). The gate electrode (1) splits to form first and second branches at a first location adjacent to the source region. These first and second branches subsequently rejoin one another at a second location adjacent to said drain region. When a potential is applied to the gate electrode (1) it will produce first and second two-dimentional carrier conduction paths at a surface of the portion of the first semiconductor layer (7) under the first and second branches. An arrangement is provided for modifying the phase of carriers passing through the first conduction path relative to the phase of carriers passing through the second conduction path to produce a phase difference for carriers received at the drain region through said first and second conduction paths.</p>
申请公布号 EP0323158(A2) 申请公布日期 1989.07.05
申请号 EP19880312218 申请日期 1988.12.22
申请人 HITACHI, LTD. 发明人 YOSHIMURA, TOSHIYUKI;IGURA, YASUO;TAKEDA, EIJI;MATSUOKA, HIDEYUKI
分类号 H01L29/205;H01L21/338;H01L29/66;H01L29/778;H01L29/78;H01L29/80;H01L29/812 主分类号 H01L29/205
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