| 摘要 |
PURPOSE:To make it possible to improve the accuracy in finishing measurements of developing and a high through put developing by a method wherein a means, with which a developing solution is discharged by natural dropping or the low pressure approximate to the natural dropping is provided. CONSTITUTION:Then first and the second developing solution discharging parts 11 and 12 are provided at the inlet part and the outlet part of a developing chamber 10. On the developing solution discharging part 11, the pressure of the developing solution fed from outside into a piping 11A is properly adjusted so that the developing solution discharged from a plurality of holes 11b will be naturally drops on the material D to be developed. The second developing solution discharging part 12 is adjusted so that the pressure of the developing solution discharged from the shower nozzle 12b becomes low pressure approximate to the natural dropping. As a result, even when the positive type photoresist having low resistivity for physical impact is used, the improvement in accuracy in finishing measurements of developing and the developing treatment having high throughput can be achieved. |
