发明名称 X-ray mask support member, x-ray mask, and x-ray exposure process using the x-ray mask.
摘要 <p>An X-ray mask support member, an X-ray mask, and an X-ray exposure process using the X-ray mask, that can effectively prevent the phenomenon of electrostatic attraction or contact of X-ray masks by appropriately disposing an X-ray mask support membrane in an exposure apparatus that employs soft X-rays, by which a high precision alignment can be performed,are provided.</p>
申请公布号 EP0323264(A2) 申请公布日期 1989.07.05
申请号 EP19880312420 申请日期 1988.12.29
申请人 CANON KABUSHIKI KAISHA 发明人 FUKUDA, YASUAKI
分类号 G03F1/22;G03F7/20 主分类号 G03F1/22
代理机构 代理人
主权项
地址