发明名称 ALL METAL MASKS FOR X-RAY LITHOGRAPHY
摘要 <p>A method for constructing an x-ray mask having a metal carrier foil supporting an x-ray absorbing structure on a metal frame characterized by providing a carrier plate coated with a nickel layer on which a carrier foil is deposited, then forming an electrodepositing mask on the carrier foil with portions of the carrier foil being exposed, electroplating gold onto the exposed portions and subsequently etching the carrier plate to form a window therein and then etching the exposed nickel layer to at least expose the surface of portions of the carrier foil.</p>
申请公布号 AU585841(B2) 申请公布日期 1989.06.29
申请号 AU19840034640 申请日期 1984.10.24
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 WALTER GLASHAUSER;WOLFHART BUTTLER
分类号 G03F1/22;H01L21/027;(IPC1-7):G03F7/02 主分类号 G03F1/22
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