| 摘要 |
PURPOSE:To permit easy removal of a resist film without using a harmful stripping soln., and to reduce the interference of light by absorbing exposed light in a flat resist, by using a water-soluble org. compd. contg. a specified amt. of an acridine deriv. CONSTITUTION:A water-soluble org. compd. contg. 1-80wt.% acridine deriv. is used for the treatment of a flat resist in a multilayer resist process. By this method, a multilayer resist is removed easily from a substrate by dissolving the flat resist with water after finishing a work of the substrate in order to remove unnecessary resist. Since 'Acrynol(R)' (an acridine deriv.) is contained in the flat resist, exposed light is absorbed in the flat resist and the interference of light is reduced. |
