| 发明名称 |
MASK TO BE CHARGED WITH PARTICLES OR RAYS, AND PROCESS FOR PRODUCING THE SAME |
| 摘要 |
<p>The mask is for use, in particular, in ion projection. It consists of a mask foil 4 held in a holding frame 1 and having a higher coefficient of expansion than the frame 1. When the mask is produced, the mask foil and the frame are heated to a temperature above room temperature and clamped at that temperature.</p> |
| 申请公布号 |
EP0223770(A3) |
申请公布日期 |
1989.06.28 |
| 申请号 |
EP19860890314 |
申请日期 |
1986.11.13 |
| 申请人 |
IMS IONEN MIKROFABRIKATIONS SYSTEME GESELLSCHAFT M.B.H. |
发明人 |
LOSCHNER, HANS, DR.;STENGL, GERHARD, DR. |
| 分类号 |
G03F1/20;G03F1/22;H01L21/027;H01L21/30;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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